CHARPAN

2007-September-24

F. van Delft, F. presents "3-dimensional Projection Mask-Less Patterning (PMLP) of microlenses and cones: modelling and monitoring of ion multi-beam kinetic sputtering in GaAs", at the MNE'07 conference taking place from 23-26 Sep 2007 in Copenhagen, Denmark.

"Structuring of GaAs has been studied in a PMPL proof-of-concept tool using a fixed lens matrix design. The re-deposition phenomena observed, and the simulation software used to model kinetic sputtering and re-deposition will help to develop tools, in order to be able to correct for the re-deposition beforehand in the design of datasets to be fed to the future programmable aperture plate for PMLP."

2007-September-20

Latest achievements in the CHARPAN tool development are presented by E. Platzgummer in Session 21 "Patterning" of the SPIE Photomask Technology (BACUS) Conference taking place from 17-21 September 2007, in Monterey, California, USA:

"The novel ion beam projection optics with 200x reduction already shows 16nm halfpitch resolution. The next phase PMLP Prototype Tool is targeted to more than 900,000 programmable beams with < 10nm resolution capability providing <10h realization time for 22nm node leading edge complex masks and <1h for nanoimprint templates."

2007-September-18

An interesting application of the CHARPAN tool, the resist-less structuring of a binary Chromium mask is presented by J. Butschke in Session 5 "Patterning" of the SPIE Photomask Technology (BACUS) Conference taking place from 17-21 September 2007, in Monterey, California, USA:

"This blank type has been developed for high resolution mask making. The achievable resolution in conventional mask making using a chemically amplified resist (CAR) on top of the chrome is usually limited by pattern collapse in resist (...).For the resist-less blank patterning the thin hard mask has been patterned by Ar ion beam milling directly."

2007-July-02

Susanne Beuer presents a poster on the "Electrical Characterisation of FIB Induced Damage in Silicon" at the ICN+T 2007 in Stockholm. This question is extremely important for CHARPAN PMLP process development, because ...

..."sputtering with focused ion beams (FIB) is an important technique for patterning in the semiconductor technology down to nanoscale size (i.e., optimization of tips for scanning probe microscopy (SPM), device modification, or nanolithography). However, the highly energetic ions induce severe damage in the target material. For silicon, this usually even leads to an amorphization of the processed area and its surrounding."

2007-April-24

The first POC-Tool Training is held for project partners at IMS Vienna.

2007-March-14

"Beam-On" is achieved with the PMLP proof-of-concept tool, realized as part of the integrated European project CHARPAN. For the first time an electrostatic ion beam projection optics with 200x reduction has been realized and is working. Already the very first exposures show resistless Argon ion multi-beam nanopatterning with <50nm resolution.

2006-Mar-13

Austrian Presidency uses CHARPAN as a showcase.

2006-Feb-23

Marc LaPedus writes about CHARPAN in EETimes: IMS to address 3D nano templates.

2006-Jan-30

NAoMITECinitiative uses CHARPAN as a success story of SMEs participating in European Nano- / Micro- Projects

2005-Dec-20

Other Projects and Major Networks of Excellence allude to the CHARPAN project:

4M Multi-Material Micro Manufacture

I*PROMS Innovative Production Machines and Systems

microsapient Coordination Action for Synergetic Process Integration of Efficient Micro & Nano Manufacture

2005-Sep-10

CHARPAN Project Fact Sheet on CORDIS

2005-April-01

CHARPAN project starts