CHARPAN

2008-March-01

The March 2008 edition of SPIE's "BACUS News" features an 8-page report on CHARPAN and its results.
BACUS is the international technical group of SPIE dedicated to the advancement of photomask technology.
The March edition of Bacus News is available from the SPIE website http://spie.org/x7238.xml

At the SPIE Photomask BACUS 2007 conference members of the CHARPAN consortium were invited to present two papers, which are available for purchase from SPIE at the following links:

Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates
Resistless mask structuring using an ion multi-beam projection pattern generator