CHARPAN

Charged Particle Nanotech

Project

Achievements in Ion beam sputtering simulation

Important progress with respect to ion beam sputtering simulation and comparison to experiments has been accomplished. This task yields information necessary for the modeling of structures by the programmable Aperture Plate System.

The comparison of experiment and IonShaperTM simulations showed broad agreement in the analysis done by S. Beuer of Fraunhofer Institute for Integrated Systems and Device Technology her colleagues and partners at IMS^[20]. Especially redeposition can be anticipated very well.

The experience gathered with the modelling and simulation of kinetic sputtering and re-deposition will help develop tools which allow correcting for re-deposition beforehand, when designing datasets to be fed to the future programmable aperture plate.

To perform 3D patterning with FIB and PMLP, it is necessary to create a seamless data flow between the CAD design packages used to create 3D models^[21] and the control systems employed by the tools for producing complex 3D structures, like the APS. Such CAD/CAM tools should satisfy the stringent requirements towards the geometric and dimensional accuracy of 3D structures imposed by various applications. Another important requirement is that these tools should be compatible with data formats such as GDSII and Gerber, which are widely utilized by the microelectronic industry.

^[20] Beuer, S. et al.: "Accurate parameter extraction for the simulation of direct structuring by ion beams", Microelectronic Engineering 84, pp. 810-813 (2007).
^[21] Lalev, G. et al.: "A CAD/CAM approach for layer-based FIB processing", 4M 2007, Borovets, Bulgaria, 3-5 Oct 2007