CHARPAN
Charged Particle Nanotech
Project
OBJECTIVES
The CHARPAN project focuses on the research and development of a new production technology for nanotechnology devices, in particular, enabling low cost engineering of complex 3D surface structures with nanometre precision. It is the aim of CHARPAN to drive the rapid development of nanoscience leading to new processes and immediate industrial exploitation.
Main Goals
Tool Specifications
Achievements in Tool Development
Achievements in Applications Development
 | • Development of multi-beam equipment for nano scale patterning and its industrial exploitation, the manufacturing of nanotech devices • R & D on novel ion-beam processes and applications for enhanced manufacturing and advanced materials • Experiments and demonstrations in cooperation with partners from industry. • Innovative research on ion beam surface processes, new ion sources, and on emerging applications in nanoscience in order to expand the application range for CHARPAN. |
The CHARPAN Proof-Of-Concept Tool is designed to meet the following specifications
| Parameter | Target specification |
| Ion Species | Ar+, optional: H+, He+, Xe+ and other ions |
| Ion-optical reduction | 200x |
| Ion beam current density at substrate | 1-10 mA/cm² |
| Exposure Field | 25 µm x 25 µm (square profile) |
| Resolution | 25 nm (down to 10 nm) |
| Surface roughness | below 5 nm, depending on the starting material and feature depth |
| Feature Shape | adjustable shape, aspect ratio (width-to-height ratio) 2-3 for sputtering, or 10-20 for reactive etching or deposition |
| Types of Materials | silicon, non-silicon materials, metals, ceramics, glass, compounds, polymers,.. |
